-17% Off

APLB Tranexamic Acid Niacinamide Facial Cream 55ml

Original price was: 1,200.00৳.Current price is: 1,000.00৳.

This cream contains Tranexamic Acid, Niacinamide, and Centella Asiatica that offers refreshing moisture recharge to skin.

55ml / All Skin Types / Made in Korea

Compare

Description

Benefits:

  • This cream contains Tranexamic Acid, Niacinamide, and Centella Asiatica that offers refreshing moisture recharge to dry skin.
  • A method of applying formulation technology that protects retinol ingredients to safely reach the skin and absorb the active ingredients with the APLB’s Formulation Technology Wide-Spread Texture system applied to Ginseng Root Extract Ingredient.
  • Cosmetic ingredient safety grade 1-2.
  • Protects the skin from irritation with weak acidity close to healthy skin pH.
  • Free of 9 ingredients without fragrance.

How To Use:
1. At the last step of skincare, apply a moderate amount on face from inner to outer along skin texture.

2. Gently dab to aid absorption.

Major Ingredients

Water, Centella Asiatica Leaf Water (28.1%), Glycerin, Cetyl Ethylhexanoate, Butylene Glycol, Polyglyceryl-3 Methylglucose Distearate, Tranexamic Acid (1,000ppm), Niacinamide (1,000ppm), Stearic Acid, Sodium Polyacryloyldimethyl Taurate, Hydrogenated Polydecene, Trideceth-10, Silica, Glyceryl Stearate, Beeswax, Butyrospermum Parkii (Shea) Butter, Macadamia Ternifolia Seed Oil, Betaine, Trehalose, Citric Acid, Nelumbo Nucifera Extract, Artemisia Annua Extract, Oryza Sativa (Rice) Extract, Saccharomyces Ferment, Solanum Melongena (Eggplant) Fruit Extract, Melaleuca Alternifolia (Tea Tree) Leaf Extract, Hydrolyzed Collagen, Squalane, Beta-Glucan, Dipropylene Glycol, Hippophae Rhamnoides Fruit Extract, Madecassic Acid, Asiaticoside, Asiatic Acid, Disodium EDTA, Propanediol, Hydroxyacetophenone, 1,2-Hexanediol, Ethylhexylglycerin, Dipotassium Glycyrrhizate

Reviews

There are no reviews yet.

Be the first to review “APLB Tranexamic Acid Niacinamide Facial Cream 55ml”

Your email address will not be published. Required fields are marked *